<efrbr:recordSet xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:efrbr="http://vfrbr.info/efrbr/1.1" xmlns:efrbr-work="http://vfrbr.info/efrbr/1.1/work" xmlns:efrbr-expression="http://vfrbr.info/efrbr/1.1/expression" xmlns:efrbr-manifestation="http://vfrbr.info/efrbr/1.1/manifestation" xmlns:efrbr-person="http://vfrbr.info/efrbr/1.1/person" xmlns:efrbr-corporateBody="http://vfrbr.info/efrbr/1.1/corporateBody" xmlns:efrbr-concept="http://vfrbr.info/efrbr/1.1/concept" xmlns:efrbr-structure="http://vfrbr.info/efrbr/1.1/structure" xmlns:efrbr-responsible="http://vfrbr.info/efrbr/1.1/responsible" xmlns:efrbr-subject="http://vfrbr.info/efrbr/1.1/subject" xmlns:efrbr-other="http://vfrbr.info/efrbr/1.1/other" xsi:schemaLocation="http://vfrbr.info/efrbr/1.1 http://vfrbr.info/schemas/1.1/efrbr.xsd"><efrbr:entities><efrbr-work:work identifier="http://purl.tuc.gr/dl/dias/8828F177-C4C1-4FE2-8C51-0ED4BB2D6D06"><efrbr-work:titleOfTheWork>Extending a 65nm CMOS process design kit for high total ionizing dose effects</efrbr-work:titleOfTheWork></efrbr-work:work><efrbr-expression:expression identifier="http://purl.tuc.gr/dl/dias/8828F177-C4C1-4FE2-8C51-0ED4BB2D6D06"><efrbr-expression:titleOfTheExpression>Extending a 65nm CMOS process design kit for high total ionizing dose effects</efrbr-expression:titleOfTheExpression><efrbr-expression:formOfExpression vocabulary="DIAS:TYPES">
            Πλήρης Δημοσίευση σε Συνέδριο
            Conference Full Paper
         </efrbr-expression:formOfExpression><efrbr-expression:dateOfExpression type="issued">2019-09-06</efrbr-expression:dateOfExpression><efrbr-expression:dateOfExpression type="published">2018</efrbr-expression:dateOfExpression><efrbr-expression:languageOfExpression vocabulary="iso639-1">en</efrbr-expression:languageOfExpression><efrbr-expression:summarizationOfContent>Standard CMOS Process Design Kits (PDKs) do not address degradation the technology incurs when exposed to high Total Ionizing Dose (TID). Front-end electronics for the High-Luminosity Large Hadron Collider are expected to be exposed up to ten-fold doses. Bulk CMOS at 65 nm is a strong contender for such electronics due to a favorable trade-off among cost, performance, and TID-sensitivity. The present paper presents the extension of a foundry-provided PDK to cover also high TID effects. TID experiments have been carried out up to 500 Mrad. The PDK is based on binned BSIM4 models, which are adapted to different TID levels. Hence, designers may choose among different TID levels for their designs, contributing importantly to radiation-hard design practice.</efrbr-expression:summarizationOfContent><efrbr-expression:useRestrictionsOnTheExpression type="creative-commons">http://creativecommons.org/licenses/by/4.0/</efrbr-expression:useRestrictionsOnTheExpression><efrbr-expression:note type="page range">1-4</efrbr-expression:note><efrbr-expression:note type="conference name">7th International Conference on Modern Circuits and Systems Technologies</efrbr-expression:note></efrbr-expression:expression><efrbr-person:person identifier="http://users.isc.tuc.gr/~Anikolaou"><efrbr-person:nameOfPerson vocabulary="TUC:LDAP">
            Nikolaou Aristeidis
            Νικολαου Αριστειδης
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            Bucher Matthias
            Bucher Matthias
         </efrbr-person:nameOfPerson></efrbr-person:person><efrbr-person:person identifier="http://users.isc.tuc.gr/~NMakris"><efrbr-person:nameOfPerson vocabulary="TUC:LDAP">
            Makris Nikolaos
            Μακρης Νικολαος
         </efrbr-person:nameOfPerson></efrbr-person:person><efrbr-person:person identifier="http://users.isc.tuc.gr/~alpapadopoulou"><efrbr-person:nameOfPerson vocabulary="TUC:LDAP">
            Papadopoulou Alexia
            Παπαδοπουλου Αλεξια
         </efrbr-person:nameOfPerson></efrbr-person:person><efrbr-person:person identifier="http://users.isc.tuc.gr/~lchevas"><efrbr-person:nameOfPerson vocabulary="TUC:LDAP">
            Chevas Loukas
            Χεβας Λουκας
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            Borghello Giulio
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            Koch Henri D.
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            Kloukinas Kostas C.
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            Poikela Tuomas S.
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            Faccio Federico
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            Institute of Electrical and Electronics Engineers
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            BSIM
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            Compact model
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            High-Luminosity Large Hadron Collider
         </efrbr-concept:termForTheConcept></efrbr-concept:concept><efrbr-concept:concept identifier="8D714C19-DD4F-44CF-8284-D928FB27CF92"><efrbr-concept:termForTheConcept>
            Ionizing radiation
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            MOSFET
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            Radiation hardness
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            Total ionizing dose
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