<efrbr:recordSet xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:efrbr="http://vfrbr.info/efrbr/1.1" xmlns:efrbr-work="http://vfrbr.info/efrbr/1.1/work" xmlns:efrbr-expression="http://vfrbr.info/efrbr/1.1/expression" xmlns:efrbr-manifestation="http://vfrbr.info/efrbr/1.1/manifestation" xmlns:efrbr-person="http://vfrbr.info/efrbr/1.1/person" xmlns:efrbr-corporateBody="http://vfrbr.info/efrbr/1.1/corporateBody" xmlns:efrbr-concept="http://vfrbr.info/efrbr/1.1/concept" xmlns:efrbr-structure="http://vfrbr.info/efrbr/1.1/structure" xmlns:efrbr-responsible="http://vfrbr.info/efrbr/1.1/responsible" xmlns:efrbr-subject="http://vfrbr.info/efrbr/1.1/subject" xmlns:efrbr-other="http://vfrbr.info/efrbr/1.1/other" xsi:schemaLocation="http://vfrbr.info/efrbr/1.1 http://vfrbr.info/schemas/1.1/efrbr.xsd"><efrbr:entities><efrbr-work:work identifier="http://purl.tuc.gr/dl/dias/CA0573C2-C184-4D5B-9D5B-BCABCA106950"><efrbr-work:titleOfTheWork>Exposure evaluation of dosimetric films by PIXE</efrbr-work:titleOfTheWork></efrbr-work:work><efrbr-expression:expression identifier="http://purl.tuc.gr/dl/dias/CA0573C2-C184-4D5B-9D5B-BCABCA106950"><efrbr-expression:titleOfTheExpression>Exposure evaluation of dosimetric films by PIXE</efrbr-expression:titleOfTheExpression><efrbr-expression:formOfExpression vocabulary="DIAS:TYPES">
            Peer-Reviewed Journal Publication
            Δημοσίευση σε Περιοδικό με Κριτές
         </efrbr-expression:formOfExpression><efrbr-expression:dateOfExpression type="issued">2015-12-02</efrbr-expression:dateOfExpression><efrbr-expression:dateOfExpression type="published">1985</efrbr-expression:dateOfExpression><efrbr-expression:languageOfExpression vocabulary="iso639-1">en</efrbr-expression:languageOfExpression><efrbr-expression:summarizationOfContent>The proton induced X-ray emission (PIXE) external beam method is used for the absolute determination of the fixed silver surface density on the fast and slow emulsion sides of Kodak Radiation Monitoring Type 2 films exposed to known gamma ray doses. The results are compared to those obtained by measuring optical densities. In the low dose range region doses as low as 1 mR can be accurately determined by the PIXE method. High exposures up to 800 R can be evaluated by direct measurements without the removal of the fast emulsion. The highest dose that can be measured by PIXE is only limited by the amount and grain size of the silver bromide on the slow emulsion side of the film.</efrbr-expression:summarizationOfContent><efrbr-expression:useRestrictionsOnTheExpression type="creative-commons">http://creativecommons.org/licenses/by/4.0/</efrbr-expression:useRestrictionsOnTheExpression><efrbr-expression:note type="journal name">Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms</efrbr-expression:note><efrbr-expression:note type="journal volume">9</efrbr-expression:note><efrbr-expression:note type="journal number">3</efrbr-expression:note><efrbr-expression:note type="page range">306-310</efrbr-expression:note></efrbr-expression:expression><efrbr-person:person identifier="http://users.isc.tuc.gr/~akatsanos"><efrbr-person:nameOfPerson vocabulary="TUC:LDAP">
            Katsanos Anastasios
            Κατσανος Αναστασιος
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            Hadjiantoniou, Alex
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            Elsevier
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