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Thin films deposition techniques

Liapakis Michail

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Summary

In the realm of modern materials science and technology, thin film deposition techniques stand as integral tools for tailoring material properties at the nanoscale. This thesis embarks on a comprehensive journey that melds a thorough review of thin film deposition techniques with the construction of a novel Physical Vapor Deposition (PVD) chamber. The initial phase of the study involves an extensive survey of the historical evolution, underlying principles, and diverse methodologies underpinning thin film deposition. From the early observations of Faraday to the intricate molecular beam epitaxy, this review encapsulates the rich tapestry of techniques that have shaped the field. This exploration sets the stage for the subsequent phase, wherein a custom PVD chamber is meticulously designed, fabricated, and integrated. The chamber, an intricate amalgamation of precision engineering and materials science, serves as a versatile platform for controlled thin film deposition. This work not only seeks to contribute to the foundational knowledge of thin film growth but also establishes a tangible embodiment of the principles explored. Through the tandem progression of historical insight and practical implementation, this thesis offers a holistic perspective on the dynamic world of thin film deposition techniques and their translation into advanced experimental apparatuses. The combined journey underscores the pivotal role of these techniques in shaping modern materials science and technology.

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